摘要
Developing a versatile etching strategy for constructing hierarchically porous metal-organic frameworks(HP-MOFs)with anticipated mesopores and micropores remains a crucial scientific challenge in probing the enhanced performance and potential applications of MOF materials.Herein,a universal vapor etching method is implemented to controllably create HP-MOFs.Based on the principle that the concentration of vapor is lower than that of the solution,the etching rate and strength toward MOFs are greatly reduced,enabling us to obtain intermediate products during etching.Using this strategy,a series of desired HP-MOFs with varying metal nodes have been prepared.The resultant HP-MOFs integrate the merits of mesopores(mass transfer facilitation)and micropores(large internal surface area).For the degradation of the nerve agent,dimethyl 4-nitrophenyl phosphate,HP-UiO-66 exhibits better catalytic activity than pristine UiO-66.
开发一种通用的蚀刻策略来构建具有期望的微孔和中孔的多级多孔金属-有机框架材料(HP-MOFs)仍然是探索MOF材料增强性能和潜在应用的一个显著性的科学挑战.本文提出了一种通用的蒸气气氛蚀刻方法来实现HP-MOFs的可控制备.基于蒸气浓度明显低于溶液浓度的原理,该方法显著降低了对MOFs的刻蚀速率和强度,能够在刻蚀过程中获得中间产物.通过该方法制备了一系列具有不同金属节点的HP-MOFs.合成的HP-MOFs结合了介孔促进传质过程和微孔提供大内表面积的优点.研究表明HP-UiO-66在神经毒剂磷酸二甲酯DMNP降解中表现出比原始UiO-66更优异的催化活性.
作者
Xu Zhai
Tianlong Cao
Xingyu Lu
Ningjie Gao
Linlin Li
Fuchun Liu
Yu Fu
Wei Qi
翟旭;曹天龙;卢星宇;高宁杰;李琳琳;刘福春;付昱;齐伟(Department of Chemistry,College of Sciences,Northeastern University,Shenyang 110819,China;Institute of Metal Research,Shenyang National Laboratory for Materials Science,Chinese Academy of Sciences,Shenyang 110016,China;Institute of Metal Research,Shenyang Key Laboratory of Nuclear Materials Safety Assessment,Chinese Academy of Sciences,Shenyang 110016,China;School of Materials Science and Engineering,University of Science and Technology of China,Hefei 230026,China)
基金
financially supported by the National Natural Science Foundation of China(22175030)
the Open Project of State Key Laboratory of Supramolecular Structure and Materials(sklssm202205)。
