调制周期数对Mo/AZO成分调制多层膜透光、反光特性以及电性能的影响

Effects of modulation period numbers on transmission,reflection and electrical properties of Mo/AZO compositionally modulated multilayers films

采用射频(RF)和单极中频脉冲直流(UMFPDC)磁控溅射技术,在300℃下制备了Mo/AZO成分调制多层膜。测试结果表明,Mo/AZO成分调制多层膜以(002)为取向的六方纤锌矿型ZnO结构为主;薄膜中Mo的化学态随薄膜厚度而变化,当薄膜厚度为1.67 nm时,Mo除单质态外,还存在部分+4和+5的离子价态,当薄膜厚度降至0.83 nm时,已无单质态Mo;调制周期数对成分调制多层膜的透光、反光特性以及电性能影响显著,当调制周期数为3时,Mo/AZO成分调制多层膜的综合性能达到最佳,电阻率、霍尔迁移率和载流子浓度分别为8.64×10^(-4)Ω·cm、8.78 cm^2)/(V·s)和8.23×10^(20)cm^(-3)。在保持金属层、半导体层总厚度不变的情况下,通过改变调制周期数可以增加薄膜的光学透过率并可在较宽范围内调节多层膜的综合性能,这为制备综合性能优异的金属/半导体型透光导电薄膜提供了一条切实可行的途径。

The Mo/AZO compositionally modulated multilayer films were prepared by radio frequency(RF)and unipolar medium frequency pulsed direct current(UMFPDC)magnetron sputtering at 300℃.The test results show that the Mo/AZO compositionally modulated multilayer films have hexagonal wurtzite structure of ZnO with preferred(002)orientation.The chemical state of Mo in the films varies with the thickness.When the thickness is 1.67 nm,there are some+4 and+5 ionic valence states in addition to the simple matter state.When the thickness decreases to 0.83 nm,there is no simple matter state of Mo.The number of modulation cycles has a significant impact on the light transmission,reflective properties and electrical properties of the compositionally modulated multilayer film.When the number of modulation cycles is 3,the comprehensive properties of the films reach the best,with resistivity,Hall mobility and carrier concentration at 8.64×10^(-4)Ω·cm,8.78 cm^(2)/(V·S)and 8.23×10^(20) cm^(-3),respectively.Changing the number of modulation cycles while maintaining the total thickness of the metal layer and the semiconductor layer unchanged,can increase the optical transmittance of the films and adjust the comprehensive performance of the films over a wide range,providing a practical and feasible way to obtain metal/semi transparent conductive films with excellent comprehensive performance.