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Single flow treatment degradation of antibiotics in water using falling-film dielectric barrier discharge

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摘要 The environmental contamination caused by antibiotics is increasingly conspicuous due to their widespread manufacture and misuse. Plasma has been employed in recent years for the remediation of antibiotic pollution in the environment. In this work, a falling-film dielectric barrier discharge was used to degrade the antibiotic tetracycline(TC) in water. The reactor combined the gas-liquid discharge and active gas bubbling to improve the TC degradation performance. The discharge characteristics, chemical species’ concentration, and degradation rates at different parameters were systematically studied. Under the optimized conditions(working gas was pure oxygen, liquid flow rate was 100 mL/min, gas flow rate was 1 L/min,voltage was 20 kV, single treatment), TC was removed beyond 70% in a single flow treatment with an energy efficiency of 145 mg/(kW·h). The reactor design facilitated gas and liquid flow in the plasma area to produce more ozone in bubbles after a single flow under pure oxygen conditions, affording fast TC degradation. Furthermore, long-term stationary experiment indicated that long-lived active species can sustain the degradation of TC. Compared with other plasma treatment systems, this work offers a fast and efficient degradation method, showing significant potential in practical industrial applications.
作者 许志远 章程 伍云健 黄邦斗 席登科 张晓星 邵涛 Zhiyuan XU;Cheng ZHANG;Yunjian WU;Bangdou HUANG;Dengke XI;Xiaoxing ZHANG;Tao SHAO(Hubei Engineering Research Center for Safety Monitoring of New Energy and Power Grid Equipment,Hubei University of Technology,Wuhan 430068,People’s Republic of China;Beijing International S&T Cooperation Base for Plasma Science and Energy Conversion,Institute of Electrical Engineering,Chinese Academy of Sciences,Beijing 100190,People’s Republic of China;University of Chinese Academy of Sciences,Beijing 100049,People’s Republic of China)
出处 《Plasma Science and Technology》 SCIE EI CAS CSCD 2024年第4期27-36,共10页 等离子体科学和技术(英文版)
基金 supported by the National Science Fund for Distinguished Young Scholars(No.51925703) National Natural Science Foundation of China(Nos.52022096 and 52261145695)。
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