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On the evolution and formation of discharge morphology in pulsed dielectric barrier discharge

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摘要 The discharge morphology of pulsed dielectric barrier discharge(PDBD) plays important roles in its applications. Here, we systematically investigated the effects of the voltage amplitude,discharge gap, and O_(2)content on the PDBD morphology, and revealed the possible underlying mechanism of the U-shaped formation. First, the morphological evolution under different conditions was recorded. A unique U-shaped region appears in the middle edge region when the gap is larger than 2 mm, while the entire discharge region remains columnar under a 2 mm gap in He PDBD. The width of the discharge and the U-shaped region increase with the increase in voltage, and decrease with the increase of the gap and O_(2)content. To explain this phenomenon,a two-dimensional symmetric model was developed to simulate the spatiotemporal evolution of different species and calculate the electric thrust. The discharge morphology evolution directly corresponds to the excited-state atomic reduction process. The electric thrust on the charged particles mainly determines the reaction region and strongly influences the U-shaped formation.When the gap is less than 2 mm, the electric thrust is homogeneous throughout the entire region,resulting in a columnar shape. However, when the gap is larger than 2 mm or O_(2)is added, the electric thrust in the edge region becomes greater than that in the middle, leading to the U-shaped formation. Furthermore, in He PDBD, the charged particles generating electric thrust are mainly electrons and helium ions, while in He/O_(2)PDBD those that generate electric thrust at the outer edge of the electrode surface are mainly various oxygen-containing ions.
作者 陈星宇 李孟琦 王威逸 张权治 彭涛 熊紫兰 Xingyu CHEN;Mengqi LI;Weiyi WANG;Quanzhi ZHANG;Tao PENG;Zilan XIONG(State Key Laboratory of Advanced Electromagnetic Technology,Huazhong University of Science and Technology,Wuhan 430074,People’s Republic of China;School of Physics,Dalian University of Technology,Dalian 116024,People’s Republic of China;Wuhan National High Magnetic Field Center,Huazhong University of Science and Technology,Wuhan 430074,People’s Republic of China)
出处 《Plasma Science and Technology》 SCIE EI CAS CSCD 2024年第4期101-113,共13页 等离子体科学和技术(英文版)
基金 financial support from the Interdisciplinary Fund of the Wuhan National High Magnetic Field Center (No. WHMFC202101)。
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