摘要
针对传统硬性衬底无法弯折的问题,采用聚萘二甲酸乙二醇酯(PEN)衬底制备柔性紫外光电探测器。柔性衬底具有的抗曲折性,能够提升探测器的鲁棒性,并且能让其适用于各种复杂形态的应用场景,同时减少占用空间,有助于整个电路的集成化。实验使用磁控溅射镀膜工艺首先在PEN衬底上生长氧化镓薄膜,并在氧化镓薄膜上生长氧化铟锡电极,在室温下成功制备柔性氧化镓紫外光电探测器,器件响应波长处于小于280 nm的深紫外区。将器件弯折20000次后其暗电流无显著变化,光电流增大,保持了良好的紫外光探测性能,探测器上升时间和衰减时间分别为0.24 s/0.74 s和0.10 s/0.71 s,其电流-时间特性曲线呈现周期性稳定,表明即使经过多次弯折,柔性氧化镓紫外探测器仍然具有良好的光电探测性能。
The emerging wide-band gap semiconductor material gallium oxide is a very promising solar blind ultraviolet detector material,which has the advantages of good stability,simple preparation process,low production cost,high temperature and high pressure resistance,etc.And the preparation materials used as flexible photodetectors can maintain good performance even when they are twisted and extended into complex non-planar shapes.However,due to the limitation of substrate temperature(generally less than 200℃),it is difficult to directly grow high-quality gallium oxide films on flexible substrates,which seriously affects the improvement and promotion of the performance of flexible ultraviolet detectors.At present,most of the transparent conductive thin flexible substrates Ga2O3 reported were prepared by magnetron sputtering method,so in order to improve reliability,we also adopted magnetron sputtering method in this experiment.The experimental process of preparing the flexible gallium oxide Ultraviolet(UV)detector on the PEN substrate is planned as follows:First,a Ga2O3 adhesive layer is formed by presputtering with DE500 magnetron sputtering equipment,and on this basis,a Ga2O3 thin film with a thickness of about 160 nm is further deposited.Finally,ITO electrode layer with thickness of about 150 nm was grown on the thin film by magnetron sputtering through the mask.The process parameters of growing Ga2O3 film on PEN substrate and ITO electrode on Ga2O3 film were set.It can be seen from the results of the structure characterization of the thin films that the XRD patterns of the PEN substrate and the PEN substrate growing gallium oxide thin films are compared,and there is only a strong diffraction peak at 25.9°in the curve,but no other diffraction peaks.This indicates that the prepared GAN films have amorphous or microcrystalline structure.The full spectrum scanning of 0~1200 eV and fine scanning of Ga 2p and O 1s were obtained.The atomic ratio of Ga and O in the prepared film is about 0.67,which is very close to the theoretical stoichiometric ratio of gallium oxide,indicating that the chemical composition of the film is accurate.The optimal spectral response of the gallium oxide photodetector from 200~400 nm corresponds to the excitation at 214 nm.The analysis shows that the average transmittance of the sample in the visible region exceeds 80%.The sample transmittance of Ga2O3 films grown in some wavelength region is higher than that of PEN substrate,which is caused by the anti-reflection effect of refractive index modulation.By observing the surface morphology of the film,it can be seen that the Ga2O3 UV detector film and ITO electrode on the PEN substrate only show slight bending traces in the bending region,and the ITO electrode of the whole sample does not appear to be broken.Therefore,it is proved that the prepared PEN substrate gallium oxide UV detector has good flexibility and bending resistance.By comparing the light and dark current curves of the device graph before and after 20000 bending,it can be observed that the light and dark current ratio of the UV detector after 20000 bending does not decrease significantly.According to the I-t characteristic curve of the response of the flexible Ga2O3 UV detector to 254 nm UV switch at 10 V bias voltage after 20000 bending,it can be seen that after the alternating opening and closing of the UV light source for 10 cycles,the current response of the detector shows a continuous rapid rise and fall,and the I-t characteristic curve presents periodic stability.It is proved that the Ga2O3 UV detector prepared on PEN substrate has excellent photoelectric performance and mechanical resistance,which provides an experimental basis and theoretical support for the development of high-performance flexible UV photodetectors.
作者
丁悦
皇甫倩倩
左清源
梁金龙
弭伟
王迪
张兴成
刘振
何林安
DING Yue;HUANGFU Qianqian;ZUO Qingyuan;LIANG Jinlong;MI Wei;WANG Di;ZHANG Xingcheng;LIU Zhen;HE Linan(School of Integrated Circuit Science and Engineering,Tianjin University of Technology,Tianjin 300384,China;Institute of Microelectronics,Chinese Academy of Sciences,Beijing 100029,China;Tianjin EF Semiconductor Technology Co.,LTD.,Tianjin 300382,China)
出处
《光子学报》
EI
CAS
CSCD
北大核心
2024年第7期49-57,共9页
Acta Photonica Sinica
基金
天津市自然科学基金(No.22JCQNJC01370)。
关键词
半导体光电探测器
柔性紫外探测器
射频磁控溅射
氧化镓
聚萘二甲酸乙二醇酯
氧化铟锡
Semiconductor photodetector
Flexible ultraviolet detector
Radio frequency magnetron sputtering
Gallium oxide
Polyethylene glycol naphthalene dicarboxylate
Indium tin oxide