摘要
目的观察磁性附着体联合卡环固位可摘义齿修复双侧游离端缺失牙列缺损的临床效果。方法选取2021年4月至2023年4月我院收治的80例双侧游离端缺失牙列缺损患者,分为对照组(40例,接受卡环固位可摘义齿修复)、研究组(40例,接受磁性附着体联合卡环固位可摘义齿修复)。比较两组的义齿松动情况、牙周健康恢复情况及不良反应发生情况。结果研究组义齿Ⅰ度松动发生率高于对照组,义齿Ⅱ度松动发生率低于对照组(P<0.05)。研究组治疗后的菌斑指数、龈沟积液、龈沟出血指数均低于对照组(P<0.05)。研究组不良反应发生率为5.00%,低于对照组的25.00%(P<0.05)。结论磁性附着体联合卡环固位可摘义齿修复双侧游离端缺失牙列缺损的效果显著,可明显改善患者的口腔环境,促进患者牙周健康恢复,且安全性较高。
Objective To observe the clinical effect of magnetic attachment combined with clasp retention removable denture in repairing dentition defect of bilateral free-end missing.Methods 80 patients with dentition defect of bilateral free-end missing admitted to our hospital from April 2021 to April 2023 were selected and divided into control group(40 cases,clasp retention removable denture repair)and study group(40 cases,magnetic attachment combined with clasp retention removable denture repair).The denture loosening,periodontal health recovery and adverse reactions were compared between the two groups.Results The incidence of degreeⅠdenture loosening in the study group was higher than that in the control group,and the incidence of degreeⅡdenture loosening was lower than that in the control group(P<0.05).After treatment,the plaque index,gingival crevicular effusion and gingival crevicular bleeding index of the study group were lower than those of the control group(P<0.05).The incidence of adverse reactions in the study group was 5.00%,lower than 25.00%in the control group(P<0.05).Conclusions Magnetic attachment combined with clasp retention removable denture has significant effect in repairing dentition defect of bilateral free-end missing,and can significantly improve the oral environment,promote the recovery of periodontal health of patients with high safety.
作者
姚德超
王耀宇
刘争灏
YAO Dechao;WANG Yaoyu;LIU Zhenghao(Department of Stomatology,Jiaozuo Second People's Hospital,Jiaozuo 454000,China)
出处
《临床医学工程》
2024年第11期1301-1302,共2页
Clinical Medicine & Engineering
关键词
磁性附着体
卡环固位
可摘义齿
双侧游离端缺失
牙列缺损
Magnetic attachment
Clasp retention
Removable denture
Bilateral free-end missing
Dentition defect