8英寸硅外延片表面质量提升

Improved Surface Quality of 8-inch Silicon Epitaxial Wafers

表面质量是8英寸硅外延片的关键技术指标,也是影响下游芯片、器件成品率的重要因素。本文通过设备工艺改进、强化现场6S管理、重点突出标准化作业指导,不断提升8英寸硅外延片表面质量,扩大产业化成果,开创国内国际市场,以科技创新促进企业高质量发展,在保证国产芯片、器件供应链安全的同时也带动了产业链上下游企业的产业整合与提升。

The surface quality of 8-inch silicon epitaxial wafers is a key technical index of silicon epitaxial wafers and an important factor affecting the yield of downstream chips and devices.Improving equipment technology can strengthen the scene 6 s management,make a emphasis on standardized work instruction,improve 8 inches silicon epitaxial wafer surface quality and extend its industrialization achievements,so as to expand domestic and international market,and promote business with scientific and technological innovation.It can also ensure security of supply chain and domestic chips,devices,and drive the consolidation and improvement of the industrial chain.