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全球集成电路技术合作研发的发展现状及其经验启示 被引量:2

Status of Global Research and Development Cooperation in Integrated Circuits and Its Inspiration
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摘要 集成电路是信息产业的基础,在社会经济发展等方面发挥了重要的作用。为系统了解中国集成电路技术创新发展情况,并应对新时期技术研发与协同发展的重大挑战,文章通过文献计量等方法,对全球集成电路技术发展现状进行初步梳理,分析了技术发展趋势和主要研发力量分工合作现状。研究结果表明,在集成电路领域,领军企业是技术创新的主体,构建了以横向水平联合为主的分工模式;以企业或科研机构等为核心组成的大型研发中心承担了重要的关键共性技术研发功能,同时呈现出全球化和区域化并存的合作发展态势。最后还结合中国集成电路领域技术研发和国家战略科技力量建设需求,提出了相关的政策和发展建议。 Integrated circuits(ICs)are the basis of the information industry and play an important role in social and economic development.To systematically understand the innovation and development of IC in China and overcome the major challenges of research and development(R&D)and coordinated development in the new era,we collate the development status of global IC and analyze the technology development trends and the global cooperation among major R&D organizations by the bibliometric method.It is found that leading IC enterprises are the main entities of technology innovation in this field,and they form a lateral cooperation mode.Meanwhile,large-scale R&D centers with enterprises or research institutes at the core play a critical role in developing key general-purpose technology,and they present the cooperation and development trends of coexisted globalization and regionalization.Moreover,relevant policy and development suggestions are put forward given the R&D status in China’s IC and the construction status of national strategic science and technology forces.
作者 王文武 罗军 王晓磊 徐昊 WANG Wenwu;LUO Jun;WANG Xiaolei;XU Hao(Institute of Microelectronics of the Chinese Academy of Sciences,Beijing 100029,China)
出处 《前瞻科技》 2022年第3期10-19,共10页 Science and Technology Foresight
关键词 集成电路 国家战略科技力量 合作模式 integrated circuit national strategic science and technology forces cooperation mode
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  • 1Dan Zhang,Xiaojing Su,Hao Chang,Hao Xu,Xiaolei Wang,Xiaobin He,Junjie Li,Fei Zhao,Qide Yao,Yanna Luo,Xueli Ma,Hong Yang,Yongliang Li,Zhenhua Wu,Yajuan Su,Tao Yang,Yayi Wei,Anyan Du,Huilong Zhu,Junfeng Li,Huaxiang Yin,Jun Luo,Tianchun Ye,Wenwu Wang.Advanced Process and Electron Device Technology[J].Tsinghua Science and Technology,2022,27(3):534-558. 被引量:1

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