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高纯三氯化硼中杂质检测技术

Impurity detection technology based on high-purity boron trichloride
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摘要 高纯电子气体是半导体工业重要原材料之一。电子级三氯化硼主要用于IC、OLED、LED等半导体技术领域,是一种性能极佳的高纯半导体材料。高纯三氯化硼在大规模集成电路制备过程中,主要用作掺杂气、警惕生长气、等离子刻蚀气、离子束刻蚀气、离子注入气等,其纯度直接影响着所制造的半导体器件性能。随着集成电路技术进步,技术节点达到7 nm,晶圆制造达到12 in,对电子级三氯化硼的要求越来越高。其产品的纯度取决于其合成方法及纯化技术的因素,其中杂质有氧、氩、氮、甲烷、一氧化碳、二氧化碳、氯气、氯化氢、光气、四氯化硅以及金属杂质。这些杂质含量的检测,对产品质量控制至关重要。本文通过对高纯三氯化硼中含有的杂质检测方法进行研究,涉及到色谱柱选择、样品前处理方式,本底背景消除以及气体池窗片的选择等影响因素的确定。建立GC、ICP-MS和FTIR等分析方法,实现高纯三氯化硼中杂质元素检测,检测精度可达到10^(-7),控制产品质量的稳定性。 High purity electron gas is one of the important raw materials in semiconductor industry.Electronic grade boron trichloride is mainly used in IC,OLED,LED and other semiconductor technology fields.It is a high-purity semiconductor material with excellent performance.High purity boron trichloride is mainly used as doping gas,vigilance growth gas,plasma etching gas,ion beam etching gas,ion implantation gas,etc.in the preparation of large-scale integrated circuits.Its purity directly affects the performance of semiconductor devices manufactured.With the progress of integrated circuit technology,the technical node has reached 7nm,and the wafer manufacturing has reached 12 in.The requirements for electronic boron trichloride are getting higher and higher.The purity of the product depends on the factors of its synthesis method and purification technology,including oxygen,argon,nitrogen,methane,carbon monoxide,carbon dioxide,chlorine,hydrogen chloride,phosgene,silicon tetrachloride and metal impurities.The detection of these impurities is very important for product quality control.This paper studies the detection methods of impurities contained in high-purity boron trichloride,involving the determination of influencing factors such as chromatographic column selection,sample pretreatment method,background elimination and the selection of gas cell window.GC,ICP-MS,FTIR and other analytical methods were established to detect impurities in high-purity boron trichloride.The detection accuracy can reach 10^(-7)and the stability of product quality can be controlled.
作者 刘颖 施旖旎 赵银凤 张英达 LIU Ying;SHI Yini;ZHAO Yinfeng;ZHANG Yingda(Dalian CREDIT Optoelectronic Material Co.,Ltd.,Dalian 116101,China)
出处 《微纳电子与智能制造》 2022年第1期115-119,共5页 Micro/nano Electronics and Intelligent Manufacturing
关键词 高纯三氯化硼 气体杂质 金属杂质 检测 high purity boron trichloride gas impurities metal impurities detection
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  • 1SEMI C3.51-1101 Specification for boron trichliride ( BC13 ) ,99. 98% quality [ S].
  • 2Impurities in Boron Trichloride and Boron Trichloride Determined by Fourier Transform Mass Spectrometry [ J].Anal chem, 1986, 58. 2797-2800
  • 3中国预防医学中心卫生研究所.大气污染监测方法[M].1984.

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