摘要
Following the previous work,in this paper,the antireflective films thicknesses,refractive indexes and reflectance spectra of different color categories of the polycrystalline silicon cells are tested and compared.It is found that the color difference of polycrystalline silicon cells is mainly caused by the antireflective film.Then the matrix transfer method is used to simulate the reflection spectra according to the actual tested parameters of the samples,and the effectiveness of the simulation is verified.Finally,according to the distribution of the spectral solar irradiance,the total solar absorption of the polycrystalline silicon cells with different antireflective film thicknesses is simulated.The optimal value of the antireflective film thickness of the polycrystalline silicon cell is calculated.This study has important guiding significance for photovoltaic(PV)enterprises to realize the optimal production of plasma enhanced chemical vapor deposition(PECVD)process in production.
作者
陈子坚
马增红
贾皓元
张链
孙艳
王石语
CHEN Zijian;MA Zenghong;JIA Haoyuan;ZHANG Lian;SUN Yan;WANG Shiyu(School of Physics and Optoelectronic Engineering,Xidian University,Xi’an 710071,China;Energy Engineering School,Tianjin Sino-German University of Applied Sciences,Tianjin 300350,China;Basic Experimental and Training Center,Tianjin Sino-German University of Applied Sciences,Tianjin 300350,China;Tianjin Yingli New Energy Co.,Ltd.,Tianjin 301510,China;Tianjin Light Industry Vocational Technical College,Tianjin 300350,China)
基金
supported by the Research Project of Tianjin Municipal Education Commission(No.2020KJ088)
