O_(2)/Ar流量比及退火对氧化锆薄膜结构及摩擦学性能的影响

Effects of O_(2)/Ar Flow Ratios and Annealing Treatment on Microstructures and Tribological Properties of Zirconia Films

采用多弧离子镀(MAIP)方法在Inconel 718高温合金基体上沉积了氧化锆(ZrOx)薄膜,并对该薄膜进行了800℃退火处理;研究了O2/Ar两种气体流量比RO2/Ar(0.25、0.43、0.67、1.00、1.50)及退火处理对沉积态薄膜的微观结构、力学性能及摩擦学性能的影响。结果表明:随着RO2/Ar从0.25升高到1.50,沉积态薄膜的主要物相组成由不稳定的锆的氧化物(h-ZrO0.35、h-ZrO2、h-Zr3O)逐渐转变为稳定的m-ZrO2,薄膜截面结构由起初疏松的柱状晶逐渐转变为排列致密的柱状晶,薄膜硬度逐渐升高,O2/Ar比为1.50时最大为16.7 GPa。低RO2/Ar下沉积的薄膜摩擦学性能很差,很快磨穿失效。当RO2/Ar超过0.67时,薄膜的摩擦寿命显著提高,RO2/Ar为1.50时薄膜磨损率最低为1.45×10-6mm3/(N·m)。沉积态薄膜经过退火处理后主要物相转变为m-ZrO2,薄膜表面变得更加光滑致密,薄膜硬度、弹性模量以及摩擦学性能均较退火前明显改善。

Zirconia films are deposited on Inconel 718 alloys by multi-arc ion plating(MAIP)equipment at different O2/Ar flow ratios.The effects of O2/Ar flow ratios(0.25,0.43,0.67,1.00,1.50)and annealing treatment on the microstructure,mechanical properties and tribological properties of films are systematically studied.The results show that with the increase of O2/Ar ratio from 0.25 to 1.50,the main phases of the deposited films change from unstable zirconium oxide(h-ZrO0.35、h-ZrO2、h-Zr3O)to stable m-ZrO2 gradually,and the cross section structures of films transform from loose columnar to compact columnar resulting obvious improvement of the hardness,and the maximum hardness is 16.7 GPa when the O2/Ar flow ratio is 1.50.The films deposited at low O2/Ar flow ratios invalid easily,but when the O2/Ar ratio exceeds 0.67,the films present outstanding friction resistance.The wear rate is only about 1.45×10-6 mm3/(N·m)when the O2/Ar flow ratio is 1.50.Furthermore,the main phases of all films transform into m-ZrO2 and the morphology become denser and smoother after annealing treatment,contributing to improvement of hardness,elastic modulus and tribological properties of the films.