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国内外光刻胶产业分析及发展建议 被引量:10

Analysis and development suggestions on photoresist industryat home and abroad
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摘要 光刻胶是集成电路光刻工艺中的关键材料,光刻胶产业具有很高的技术壁垒,市场基本被国外企业垄断。近年来,随着集成电路芯片制造产能向中国大陆转移,我国对光刻胶的需求稳步增加,实现进口替代的需求迫切。本文针对光刻胶产业,从全球产业情况、相关产业巨头、产业特点以及国内光刻胶产业面临的问题方面进行综合阐述,最后提供了国内光刻胶产业的发展建议。 Photoresists play a major role in photolithography while fabricating integrated circuits.The photoresist industry has high technical barriers,and the market is mainly monopolized by foreign companies.In recent years,with the transfer of production capacity to China's Mainland,the demand for photoresist has steadily increased,and it is urgent to realize import substitution.This article focuses on the photoresist industry,comprehensively elaborating on the global industry situation,related industry giants,industry characteristics and the problems faced by the domestic photoresist industry,and finally provides suggestions for the development of the domestic photoresist industry.
作者 朱宇波 黄嘉晔 ZHU Yu-bo;HUANG Jia-ye(Shanghai Institute of Microsystem and Information Technology,Chinese Academy of Sciences,National Key Laboratory for Information Functional Materials,Shanghai 200050,China;Shanghai Institute of IC Materials,Shanghai 20050,China)
出处 《功能材料与器件学报》 CAS 2020年第6期382-386,共5页 Journal of Functional Materials and Devices
关键词 光刻胶 集成电路制造 产业分析 Photoresist Integrated circuit fabrication Industry analysis
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