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典型医用钛合金材料电子结构及力学性能研究 被引量:2

Electrical and mechanical properties of typical medical metal materials
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摘要 随着科技的飞速发展,在二十一世纪的今天,许多金属运用于现代医学领域;其中钛及其合金因其高强度、低弹性模量、生物相容性好等优势,而占据医用金属材料的半壁江山。二氧化钛(TiO2 )由于其具有优异的能带结构、较好的化学稳定性、较高的催化性以及较低的价格,从而使其在体外辅助治疗材料方面应用最为广泛。本文基于密度泛函理论的第一性原理赝势法对不同结构的TiO2和二元β型钛合金(Ti-Mo)的电学参数(禁带宽度、态密度)和力学性能(弹性常数、弹性模量)进行了理论模拟计算。计算结果表明金红石型TiO2是禁带宽度为2.03eV的直接半导体;锐钛矿型TiO2是禁带宽度2.15eV的间接半导体。对Ti15Mo1、Ti9Mo7、Ti1Mo15三种Ti-Mo合金的计算结果表明,随着Mo元素的增加,Ti-Mo合金的β稳定性提升,弹性模量B、E、G均有所增加。 With the rapid development of science and technology, in the twenty-first Century, many metals were used in the field of modern medicine, in which titanium and its alloys occupy half of the medical metal materials because of their advantages of high strength, low modulus of elasticity and good biocompatibility. Titanium dioxide(TiO2) is the most widely used in vitro assisted treatment materials because of its excellent band structure, good chemical stability, high catalytic activity and low price. Based on the density functional theory, the first principle pseudopotential method is used to simulate the electrical parameters(forbidden band width, state density) and mechanical properties(elastic constants and elastic module) of different structures of TiO2 and two element beta titanium alloy(Ti-Mo). The results show that rutile TiO2 is a direct semiconductor with a band gap of 2.03 eV, and anatase TiO2 is an indirect semiconductor with a band gap of 2.15 eV. The calculation results of three Ti-Mo alloys of Ti15 Mo1, Ti13 Mo3 and Ti11 Mo5 show that the stability of Ti-Mo alloy increases with the increase of Mo element, and the modulus of elasticity of B, E and G all increase.
作者 张婷 汪可 ZHANG Ting;WANG Ke(Department Of Bio medical Engineering,Chengdu Medical College,Chengdu 610500 China)
出处 《功能材料与器件学报》 CAS 2020年第1期35-40,共6页 Journal of Functional Materials and Devices
基金 四川省科技厅基金(2018GFW0063) 四川省教育厅科技项目(13Z041)。
关键词 TIO2 Ti-Mo 电子结构 力学性能 第一性原理 TiO2 Ti-Mo electrical parameters mechanical properties first principles
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  • 1孙立忠,陈效双,郭旭光,孙沿林,周孝好,陆卫.CdTe和HgTe能带结构的第一性原理计算[J].红外与毫米波学报,2004,23(4):271-275. 被引量:10
  • 2陈强,曹红红.Ab initio calculations of electronic structure of anatase TiO2[J].Chinese Physics B,2004,13(12):2121-2125. 被引量:6
  • 3曹红红,黄海波,陈强.对锐钛矿相TiO_2的第一原理计算[J].北京航空航天大学学报,2005,31(2):251-254. 被引量:7
  • 4马灵灵,郑毓峰,侯娟,匡代洪,孙言飞,简基康.自掺杂Te生长CdTe薄膜的结构及其光学性质研究[J].新疆大学学报(自然科学版),2007,24(2):175-179. 被引量:1
  • 5Merad A E, Kanoun M B, Merad G, et al. Full-potential investigation of the electronic and optical properties of stressed CdTe and ZnTe [ J]. Materials Chemistry and Physics, 2005, 92: 333-339.
  • 6Komin V, Tetali B, Viswanathan V, et al. The effect of the CdCl2 treatment on CdTe/CdS thin film solar cells studied using deep level transient spectroscopy [J]. Thin Solid Films, 2003, 431-432: 143-147.
  • 7Yao K L, Gao G Y, Liu Z L, et al. Half-metallic ferromagnetic semiconductors of V- and Cr-doped CdTe studied from firstprinciplespseudopotential calculations [ J]. Physica B, 2005, 366 : 62-66.
  • 8Segall M D, Lindan P J D, Probert M J, et al. First-principles simulation: ideas, illustrations and the castep code [J]. J Phys Condens: Matter, 2002, 14(11) : 2717-2744.
  • 9Madelung O (ed). Landolt-bornstein: numerical data and functional relationships in science and technology-new series [M]. Berlin: Springer- Verlag, 1982. 17(Parts a and b) ; 1987. 22(Part a).
  • 10Gil B, Dunstan D J. Tellurium-based Ⅱ - Ⅵ compound semiconductors and heterostructures under strain [ J]. Semicond Sci Technol, 1991, 6(6) : 428-438.

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