期刊文献+

铝的低价硫化物歧化反应的应用研究

Application Study of disproportionation reaction of Al Sub-sulphide
下载PDF
导出
摘要 对用低价硫化铝的歧化反应在镀铝膜和富集催化剂中贵金属作了研究。用蒸发源(4Al+Al2S3)进行反应蒸发镀膜,系统真空度为5Pa左右,温度为1100℃。所得镀层表面光滑、平整,扩散层厚。镀膜层为Fe3Al及AlFe两相,镀膜时,基体温度应大于800℃。用该种方法富集催化剂中贵金属时,试验表明,在温度1200~1400℃、真空度大于666.7Pa下,反应蒸馏3h,可使氧化铝还原20%左右,贵金属富集1.2倍;相同条件下蒸馏四次,可使贵金属富集1.6倍,收率大于92%,实验中得到表面严重氧化的细小铝颗粒,该问题的解决有待进一步的研究。 Filming on steel and Concentrating precious metals contained in the waste catalyst by reducing Al_2O_3 using the disproportionation reaction of sub-sulphide of Al was Studied roughly. It indicates that the coat with thick diffusion layer and bright smooth surface by evaporation of (4Al+Al_2S_3) consists of Fe_3Al and AlFe. The temperature of material coated isn't allowed to be 800 ℃ below. When Concentrating precious metals from the waste catalyst under condition of temperature(1 200-1 400 ℃), vacuum(>666.7...
出处 《有色矿冶》 2005年第1期41-44,共4页 Non-Ferrous Mining and Metallurgy
关键词 低价硫化铝 镀膜 催化剂 贵金属富集 Sub-sulphide Filming Catalyst Concentration of precious metals
  • 相关文献

参考文献6

  • 1[4]Rendt R. A., New flexible reactor design for R&D. PECVD deposition systems[J]. Surface and Coatings Technology, 1993, 59(1~3):148~151.
  • 2[5]Kulisch W. Remote plasma - enchanced chemical vapor deposition withmetal organic source gases principles and applications[J]. Sur face and Coatings Technology, 1993, 59(1 ~ 3):193~201.
  • 3[6]Trie K., Synthesis of thin coatings by plasma-assisted chemica vapor deposition using metal-organic compounds as preeurs[J].Surface and Coatings Technology, 1993, 59(1~3):202~206.
  • 4吴冠民.从失效催化剂中回收钯的工艺研究[J].贵金属,1987,8(3):11-17.
  • 5孙萼庭.从失效催化剂中回收铂的工艺[J].贵金属,1996,17(2):32-34. 被引量:6
  • 6姚洪,林桂燕.从废催化剂Pd-Al_2O_3中提取钯[J].贵金属,1997,18(1):25-27. 被引量:21

共引文献26

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部