摘要
The synthesis of carbon nitride films at low temperature has been investigated using pulsed arc discharge from methanol solution with nitrogen atmosphere. Raman spectra and X-ray diffraction (XRD) analysis suggest that crystalline carbon nitride films may be prepared at low substrate temperature (220 ℃). At same time, the substrate temperature has a significantly effect on the nitrogen content and structure of the films. Increasing substrate temperature (300 ℃) would decrease the content of nitrogen in the films and result in a formation of carbon films.
The synthesis of carbon nitride films at low temperature has been investigated using pulsed arc discharge from methanol solution with nitrogen atmosphere. Raman spectra and X-ray diffraction (XRD) analysis suggest that crystalline carbon nitride films may be prepared at low substrate temperature (220 ℃). At same time, the substrate temperature has a significantly effect on the nitrogen content and structure of the films. Increasing substrate temperature (300 ℃) would decrease the content of nitrogen in the ...
出处
《无机化学学报》
SCIE
CAS
CSCD
北大核心
2004年第3期349-352,240,共5页
Chinese Journal of Inorganic Chemistry
基金
武汉市青年晨光计划资助项目(No.20025001014)。
关键词
脉冲电弧放电
氮化碳
甲醇
pulsed arc discharge carbon nitride methanol
