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NiTi形状记忆合金表面辉光离子氮化层的结构与性能 被引量:1

Microstructure and Characteristics of Ion-nitrided Layer on Surface of NiTi SMAs
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摘要 为改善NiTi形状记忆合金表面的生物相容性,采用辉光离子氮化的方法在其表面制备了氮化层,利用多种手段对其表面氮化层的显微组织结构以及表面性能进行了研究。结果表明:经过900℃辉光离子氮化后,不仅在NiTi形状记忆合金表面形成了致密、均匀的TiN层,而且在基体与TiN层之间还形成了均匀的Ti2Ni过渡层,且随着氮化时间的延长,膜层及过渡层的厚度都随之增加。生成的氮化层大大提高了NiTi形状记忆合金的耐腐蚀性能。 In order to modify the biocompatibility of NiTi shape memory alloy,ion nitriding was used to perform nitriding on the surface of NiTi SMA alloy.The microstructure and characteristics of the nitrided surface were investigated by the methods.The results show that by ion-nitriding a tense TiN layer is obtained on the outer surface and a Ti2Ni transition layer is present between the outer surface and NiTi substrate,which has greatly enhanced the corrosion resistance of NiTi shape memory alloy and excellent cohe...
出处 《机械工程材料》 CAS CSCD 北大核心 2008年第1期55-58,共4页 Materials For Mechanical Engineering
基金 中国博士后科学基金资助项目(20060390199)
关键词 NITI形状记忆合金 辉光离子氮化 TIN TI2NI 耐腐蚀性能 NiTi SMAs ion nitriding TiN Ti2Ni corrosion resistance
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参考文献9

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共引文献14

同被引文献19

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