一种OPC友好的迷宫布线算法

OPC-Friendly Maze Routing Algorithm

超深亚微米集成电路制造中广泛应用OPC技术来减少掩模图形的光刻畸变,改善成像质量.然而在当前的设计流程中,版图设计者并没有考虑版图的OPC友好性问题,从而使一些图形由于原始形状限制无法进行充分的OPC校正处理.本文提出了一种OPC友好的迷宫布线算法:在布线的同时进行快速点光强计算,来预测走线对未来OPC的影响,避免可能导致OPC失败的布线结果,同时尽可能减少OPC需要做出的校正.

OPC is widely employed in deep sub-micron IC manufacture,to alleviate the distortion of printed silicon image.However,the current design flow does not take OPC into consideration during physical design stage.This might result in mask patterns that cannot be corrected by OPC.Thus,we propose an OPC-friendly maze routing algorithm,which links fast lithography simulation with an enhanced maze router,to guarantee the success of OPC and to ease the heavy burden of OPC.