期刊文献+

沉积纳米尺度金属膜制备电子纺织材料 被引量:6

Depositing Nanoscale Conductive Layer on Non-Woven Substrate for Developing Electronic Textiles
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摘要 针对现有电子纺织材料存在的刚性大,织造性差或是加工工艺复杂,易产生污染等问题,研究和开发基于聚合物纤维,具有工业应用前景,以低温磁控溅射表面沉积技术为工艺的新型电子纺织材料的加工方法,分析探索在聚合物纤维表面构建的功能性镀层的微观结构和电学性能,在纳米尺度上研究了具有良好导电性能的金属(铝、铜、银)镀层的微观结构与性能的关系,为电子纺织材料的开发和应用提供科学依据.柔性透气的新型电子纺织材料的开发和应用会拓展纺织材料在电子产品,通信产品,医疗用品和文化娱乐等许多领域的应用,推动基于纺织材料的计算技术、通信技术以及传感技术集成和应用. The aim of this work is to develop a new technique to develop electronic textiles, that is, depositing conductive layer on the surface of non-woven fabrics at room temperature by DC magnetron sputtering process. This new technique got ride of such shortcomings of traditional electronic textiles as complicated processing and water pollution.The electricity properties and surface structures of the electronic functional layer on the non-woven substrate.were analyzed. The relations between the micro-structure o...
出处 《电子器件》 CAS 2007年第6期1988-1990,1994,共4页 Chinese Journal of Electron Devices
关键词 非织造布 电子纺织品 磁控溅射 功能化 表面 Non-woven fabric electronic textiles magnetron sputtering functionalization surface
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参考文献14

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