期刊文献+

SED的磁控溅射法制作技术试验研究 被引量:3

Research on SED Fabrication with Magnetron Sputtering
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摘要 介绍了表面传导电子发射显示(SED),采取了一种使用PdO膜和ZnO膜磁控溅射制作SED的方法,它具有发射均匀的优点。SED器件的电极厚度、导电膜材料、导电膜宽度对发射性能有很大影响,文中对这些参数进行了讨论。通过参数的优化,得到了稳定、均匀的电子发射。 A novel method for fabrication of the surface-conduction electron-emitter display (SED) with magnetron sputtering is demonstrated, which has the advantage of uniform. Parameters include thickness of device electrodes, materials and width of the conducting film which influent the performance of SED are discussed. Through optimization of these parameters, stable and uniform electron emission has been obtained.
出处 《真空电子技术》 2008年第2期30-33,共4页 Vacuum Electronics
关键词 表面传导电子发射显示器 磁控溅射 导电膜 SED Magnetron sputtering Conducting film
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参考文献6

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同被引文献29

  • 1李玉魁,朱长纯.新型三极碳纳米管场发射器件的研究[J].液晶与显示,2004,19(6):423-426. 被引量:11
  • 2应根裕.36英寸表面传导电子发射显示器[J].现代显示,2005(10):37-41. 被引量:4
  • 3牟强,张方辉,费民权.表面传导电子发射显示技术进展[J].液晶与显示,2006,21(3):226-231. 被引量:4
  • 4吴凯,李德杰.一种新型的表面传导电子发射阴极[J].真空科学与技术学报,2006,26(5):339-342. 被引量:8
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