射频磁控溅射ZnO薄膜的微结构与光学特性

Microstructure and Optical Properties of ZnO Thin Films by RF Magnetron Sputtering

研究了膜厚对ZnO薄膜微结构和光学性能的影响。采用射频磁控溅射法在单晶硅(111)和玻璃基片上制备了不同厚度的ZnO薄膜。通过X射线衍射、原子力显微镜和紫外可见光谱对薄膜进行了表征。结果表明薄膜结晶性能良好,在(002)晶面具有明显的c轴取向。随着薄膜厚度的增加,透射率下降,吸收边红移,禁带宽度逐渐减小。

The microstructure and optical properties of ZnO thin films were studied in details. ZnO thin films were deposited on silicon(111)and glass substrates by RF magnetron sputtering. XRD, AFM and UV-Vis spectra were employed to characterize the samples. It is found that ZnO thin films show excellent crystallization and the C-axis-orientated of (002) is obvious. As thickness of the ZnO thin films increases, the grain size grows, the transmission rate decreases and the absorption edge shifts towards long-waveleng...