简易低成本柔性神经微电极制作方法

A simple and low-cost method to fabricate flexible microelectrodes for neural applications

提出了一种简单、低成本的植入式柔性薄膜神经微电极的制作工艺和方法。该方法采用光敏型聚酰亚胺(Durim-ide 7510)代替传统方法中的非光敏型聚酰亚胺或聚对二甲苯作为微电极基质材料,同时设计了一种基于应力集中的凹槽结构以保证所得微电极形状的规整性,且采用了一种基于硅导电性通过电化学腐蚀牺牲层的方法来实现微电极从支撑基片表面的完整自动释放。整个制作工艺简单,仅需两次光刻和两次金属沉积。测试和评价了所制作微电极的表面形貌、电学性能以及生物相容性,结果表明,这种方法大大降低了制作成本并缩短了周期。

A simple and low-cost method to fabricate implantable flexible thin-film microelectrodes is described for neural applications.A photosensitive polyimide(Durimide 7510) is used as substrate materials instead of non-photosensitive polyimide or parylene in conventional process.A new self-shaped technique for thin-film electrode is also employed in the scheme.In addition,an easy and mild release procedure based electrochemical etch is proposed to detach microelectrodes from the fabrication substrate.The whole process using only two masks and two depositions is simple and fast,and can greatly reduce the time and cost of fabrication of neural microelectrodes. The geometrical,electrical properties and biocompatibility of the microelectrodes are also discussed.