摘要
以环氧缩水甘油醚、1,6-己二酸、丙烯酸、KH-550处理的纳米SiO2(HTSi-3)为主要原料合成了光敏稀释剂(AD)。环氧丙烯酸酯(EA)、AD、光引发剂和适量助剂配合制成光固化材料,测试了其光聚合反应特征、力学性能和耐热性。结果表明,由含HTSi-3的AD改性EA体系有较快的光固化速度和较高的光固化程度(DOC)。另外,用AD对EA改性后,提高了光固化材料的拉伸强度、冲击强度及耐热性。
A novel photosensitive active diluents(AD) was synthesized from nano-SiO_2(HTSi-3),glycol diglycidyl ether,adipic acid and acrylic acid.UV curing composite materials were prepared from EA resin,AD,photo initiator,and the additives. The photo polymerization characteristics,mechanical property and heat-resistance capabilities of the UV-curing materials were also tested.The results indicate that the UV-curing composite material containing HTSi-3 was of faster reactive speed and of higher degree of cure(DOC).The UV cured composite materials modified by ADs exhibit high tensile strength,good impact strength and heat-resistant property.
出处
《材料科学与工程学报》
CAS
CSCD
北大核心
2007年第5期768-771,共4页
Journal of Materials Science and Engineering
