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反应离子刻蚀的模型及仿真

RIE Model and Simulation
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摘要 介绍了反应离子刻蚀的二维模型,模型包括各项同性刻蚀和各向异性刻蚀两部分.为模拟反应离子刻蚀过程中材料的表面轮廓,采用线算法和元胞算法的混合算法,用C++编写计算机模拟软件.模型中的参数随反应离子刻蚀工艺参数的变化而变化,由实验提取.软件可以模拟任意起始条件下不同材料的刻蚀形貌.给出的模拟结果与实验结果吻合.
作者 朱赤 李伟华 周再发
机构地区 东南大学MEMS教育部重点实验室
出处 《中国机械工程》 EI CAS CSCD 北大核心 2005年第z1期255-257,共3页 China Mechanical Engineering
基金 国家杰出青年科学基金资助项目(50325519)
关键词 反应离子刻蚀(RIE) 二维模型 线算法和元胞算法的混合算法 计算机仿真
分类号 TN405 [电子电信—微电子学与固体电子学]
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参考文献7

  • 1李建华,高曙明,刘玉生.基于几何模型的表面微加工MEMS工艺层模型生成[J].计算机集成制造系统-CIMS,2003,9(12):1126-1131. 被引量：3
  • 2[2]Shuichi Yamamoto, Tokuo Kure, Masanori Ohgo,et al. A Two-dimensional Etching Profile Simulator: ESPRIT. IEEE, 1987,6(3):417～422
  • 3[3]Zhou R C, Zhang H X, Hao Y L,et al. Simulation of the Bosch Process with a String-cell Hybrid Method. IOP Publishing Ltd, 2004,14:851～858
  • 4[4]Bhardwaj J, Asharf H, McQuarrie. Dry Silicon Etching for MEMS Presented at The Symposium on Microstructrues and Microfabricated Systems at the Annual Meeting of the Eclectromechanical Society.Surface Technology System Limited, Montreal,Quebec, Canada, 1997
  • 5[5]Tina J, Cotler ,Ann Arbor. Reactive-ion-etch Profile Evolution Determined by a Monte Carlo Microtopography Model. J. Vac. Sci. Technol. B,1990,8(3): 523～528
  • 6[6]Strasser E, Selberherr S. Algorithm and Models for Cellular Based Topography Simulation. IEEE Transactions on Computer-aided Design of Integrated Circuits and Systems, 1995, 14 (9): 1104～1114
  • 7[7]Scheckler E W, Neureuther A R. Models and Algorithms for Three-Dimensional Topography Simulation with SAMPLE-3D. IEEE Transactions on Computer-aided Design of Integrated Circuits and Systems, 1994,13 (2): 219～ 230

二级参考文献9

  • 1[1]KOPPELMAN G M.OYSTER, a threedimensional structure simulator for microelectromechanical design[J].Sensors and Actuators, 1989,20:179-185.
  • 2[2]OSTERBERG P M, SENTURIA S D. MemBuilder:an automated 3D solid model construction program for microelectromechanical structures[A]. Proc. of the 8th International Conference on Solid-State Sensors and Actuators(Transducers'95) and EuroSensors IX[C] . Stockholm, Sweden:IEEE,1995.21-24.
  • 3[3]DEVOE D L, GREEN S B,JUMP J M.Automated solid model extraction for MEMS visualization[A] .Technical Proceedings of the 1998 International Conference on Modeling and Simulation of Microsystems(MSM'98)[C].Computational Publications,1998.292-297.
  • 4[4]ANANTHAKRISHNAN V. Part-to-art:basis for a systematic geometric design tool for surface micromachined MEMS[D].Toledo,Ohio:Univ. of Toledo,2000.
  • 5[5]ANANTHAKRISHNAN V,SARMA R,ANANTHASURESH G K.Systematic mask synthesis for surface micromachined microelectromechanical systems[J]. Journal of Micromechanics and Microegineering(IOP),2003,13:927-941.
  • 6[6]GAO F, HONG S Y, SARMA R.Feature model for surface micro-machined MEMS[A]. Proceedings of the 2003ASME Design Engineering Technical Conference[C].Chicago,Illinois,USA:ASME,DETC2003/CIT-48186.
  • 7[8]LONG M K. Computer aided mask layout synthesis for anisotropic etch photolithography[D].California,USA:California Institute of Technology, 1999.
  • 8[9]LI H. Evolutionary techniques applied to mask-layout synthesis in micro-mechanical-electronic systems(MEMS)[D].Pasadena CA:, California Institute of Technology,1999.
  • 9[10]KOESTER D, COWEN A, MAHADEVAN R, et al. PolyMUMPs design handbook revision 8.0[Z]. MEMSCAP,2002.

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中国机械工程
2005年 第z1期

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