用纳米碳制备光子晶体

FABRICATION OF PHOTONIC CRYSTALS BY NANOCARSON

利用电子束诱导沉积纳米碳柱方法,在一台由ＫＹＫＹ１０１０Ｂ型扫描电子显微镜(ＳＥＭ)改装的电子束曝光系统中发展了一种无需光刻胶的亚微米图形化技术,微型碳柱的高度和直径可通过改变聚焦电子束参数加以控制．通过控制电子束辐照位置和对样品台相对漂移的修正,在镀金的半导体表面８μｍ×８μｍ范围内分别得到由纳米碳柱形成的光子晶体点阵,包括正方、六方对称和八重准对称等点阵结构,为进一步开展半导体光子晶体的实验研究打下了良好的基础．

A technique of resistless nano-patterning was developed in an electron beam lithographic system modified from a KYKY1010B scanning electron microscope(SEM). This approach is based on a phenomenon of electron beam-induced de-position(EBID) of carbonaceous nano-cone. The height and diameter of the carbon nano-cones were controlled by the parameters of the focused electron-beam during the deposition. After careful correction for shift of the expected e-beam exposure point relative to the sample holder, the two-dimentional photonic crystals with square, triangular arrays and the octagonal quasi-symmetric array with an area about 8μm × 8μm were successfully fabricated on the gold film coated semiconductors. This success provided a possible route towards experimental study of the semiconductor photonic crystals.