陡脉冲电场对细胞凋亡的影响及机理的研究

The Study of Apoptosis and Mechanism of Cells Exposed to Steep Pulse

我们使用自行设计的陡脉冲施加装置,对贴壁生长的人肝癌细胞(SMMC-7721)和人正常肝细胞(HL-7702)施加脉冲电场。研究在陡脉冲电场作用下细胞的凋亡及其相关的机理。结果表明,电压值超过200V以上的陡脉冲电场可以诱发肿瘤细胞凋亡,250V的电场比200V电场作用下肿瘤细胞的凋亡程度更大;而正常细胞对电场刺激的敏感程度低于肿瘤细胞。激光共聚焦显微镜测定陡脉冲电场作用下细胞内游离钙浓度变化结果表明,细胞外无钙条件下,150V电场作用下胞内钙离子浓度未发生明显变化,200V电场作用下,胞内钙离子浓度明显下降,250V电场作用下胞内钙离子浓度陡然下降,下降幅度比200V电场作用时大。细胞外有钙条件下,150V电场作用下胞内钙离子浓度未发生明显变化,200V和250V电场作用下胞内钙离子浓度略有下降。提示胞内钙离子浓度变化可能是陡脉冲作用下肿瘤细胞凋亡的机制。

This experiment was designed to study the apoptosis and related mechanism of adherent liver tumor cells (SMMC-7721)and adherent normal liver cells (HL-7702) when they were exposed to the steep pulse generated by the steep pulse apparatus for tumor treatment. The results showed that the steep pulse of 200 V could induce tumor cells apoptosis. The tumor cells presented with their apoptosis when they were exposed to the steep pulse from 200 V to 250 V. Laser scanning confocal microscopy was used to make a real...