期刊文献+

电子和中子辐照n型6H-SiC的光致发光谱

Photoluminescence of Electron-and Neutron-Irradiated n-Type 6H-SiC
下载PDF
导出
摘要 对用电子能量为1.7,0.5和0.4MeV的电子辐照和中子辐照后的n型6H-SiC样品进行低温光致发光研究.对于Ee≥0.5MeV电子辐照和中子辐照后的样品,首次发现了位于478.6/483.3/486.1n m的S1/S2/S3谱线.对样品进行热退火研究表明S1/S2/S3谱线在500℃下消失,而退火温度高于700℃时D1中心出现.考虑到产生C空位和Si空位所需的位移阈能以及热退火行为,说明S1/S2/S3为初级Si空位初级缺陷,而D1中心为二次缺陷.
出处 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2006年第z1期11-14,共4页 半导体学报(英文版)
基金 国家自然科学基金资助项目(批准号:60076010) Project supported by the National Natural Science Foundation of China (No. 60076010)
关键词 6H-SIC 辐照 LTPL 缺陷
  • 相关文献

参考文献16

  • 1[1]Egilsson T,Henry A,Ivanov I G,et al.Photoluminescence of electron-irradiated 4H-SiC.Phys Rev B,1999,59 (12):8008
  • 2[2]Storasta L,Bergman J P,Janzén E,et al.Deep levels created by low energy electron irradiation in 4H-SiC.J Appl Phys,2004,96(9):4909
  • 3[3]Chen X D,Ling C C,Gong M,et al.Anomalous behaviors of E1/E2 deep level defects in 6H silicon carbon.Appl Phys Lett,2005,86:031903
  • 4[4]Weidner M,Frank T,Pensl G,et al.Formation and annihilation of intrinsic-related defect centers in high energy electron-irradiated or ion-implanted 4H-and 6H-silicon carbide.Physica B,2001,308~310:633
  • 5[5]Chen X D,Fung S,Ling C C,et al.Deep level transient spectroscopy study of neutron-irradiated n-type 6H-SiC.J Appl Phys,2003,94 (5):3004
  • 6[6]Chen X D,Yang C L,Gong M,et al.Low energy electron irradiation induced deep level defects in 6H-SiC:the implication for the microstructure of the deep levels E1/E2.Phys Rev Lett,2004,92(12):125504
  • 7[7]Wang O,Ding Y L,Zhong Z Q,et al.Low-temperature photoluminescence studies on the characteristics of irradiated 6H-SiC.Chinese Journal of Light Scatting,2003,16 (1):66
  • 8[8]Fung S,Chen X D,Beling C D,et al.Photoluminescence study of beryllium implantation induced intrinsic defects in 6H-silicon carbide.Physica B,2001,308~310:710
  • 9[9]Fissel A,Richter W,Furthmüller J,et al.On the nature of the D1-defect center in SiC:a photoluminescence study of layers grown by solid-source molecular-beam epitaxy.Appl Phys Lett,2001,78(17):2512
  • 10[10]Bergman J P,Jakobsson H,Storasta L,et al.Characterisation and defects in silicon carbide.Mater Sci Forum,2002,part.1(9~14):389

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部