Co-Ti-O纳米颗粒合金薄膜的磁阻特性

Evaluation of Magnetoresistance Characteristic of Co-Ti-O Granular Alloy Thin Films

利用直流与射频磁控溅镀在二氧化硅基板上共沉积制作Co-Ti-O颗粒合金单层薄膜,并通过适当热处理,使薄膜为Co及TiOx混合结晶相.单层颗粒合金薄膜Co59.78Ti16.5O23.7/SiO2试片经1000℃热处理10min,磁阻率为0.8%,而Co27.95Ti19.33O52.72/SiO2试片经1000℃热处理10min,磁阻率高达4%.

This study aimed at evaluating microstructure and magnetoresistance effects of sputtered Co-Ti-O granular thin films on SiO2 substrate.As-deposited Co-Ti-O films were annealed by a rapid thermal annealer(RTA) to yield Co-TiOx mixed phases due to Co precipitation in TiOx matrix at an elevated temperature.Annealing induced phase formation of the studied films was examined by using XRD and TEM.Magnetoresistances of 0.8% and 4% at room temperature were found for Co59.78Ti16.5O23.7/SiO2 and Co27.95Ti19.33O52.72/SiO2,respectively.