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大剂量Mn离子注入GaAs的性质 被引量:1

High Dose Mn Implanted GaAs
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摘要 在室温条件下在半绝缘性GaAs衬底上进行了大剂量Mn离子的低能注入,并进行了不同条件的退火.借助于X射线衍射(XRD)和高分辨X射线衍射(HR-XRD)进行了结构分析,经过退火后生成的新相衍射峰增多,根据衬底(004)峰摇摆曲线分析结果退火后更多的Mn离子进入晶格.运用原子力显微镜分析了样品的表面,发现退火后突起的起伏度增加.磁性分析表明,退火样品的磁化强度增大.
出处 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2005年第z1期24-27,共4页 半导体学报(英文版)
基金 国家自然科学基金(批准号:60176001,60206007),国家重点基础研究发展计划(批准号:G20000365,G2002CB311905)资助项目
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参考文献11

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同被引文献12

  • 1马宝珊,王文杰,苏付海,邓加军,蒋春萍,刘海林,丁琨,赵建华,李国华.GaMnAs的Raman光谱研究[J].红外与毫米波学报,2006,25(3):207-212. 被引量:2
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