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非理想情况下薄膜Oliver&Pharr压入硬度的校正

Correction of Oliver & Pharr Indentation Hardness of Thin Solid Films under Non-ideal Condition
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摘要 通过量纲分析及有限元数值计算,提出了Berkovich压头尖端钝化情况下残余压应力场中薄膜Oliver&Pharr压入硬度的校正公式及相应校正程序。根据该方法,只要测定薄膜纳米压入加卸载曲线、薄膜中的残余压应力及压头的相对钝化量,便可最终确定理想压头下无残余应力时的薄膜硬度。 Dimensional analysis and finite element method were employed to analyze the changes of Oliver&Pharr hardness of thin solid films measured in residual compressive stress field with blunt indenter .Then the correcting method is proposed. By this method the Oliver&Pharr hardness of thin solid films measured by ideal indenter can be determined,in which the residual compressive stress does not exist.
作者 王惠 马德军
机构地区 西北核技术研究所 装甲兵工程学院机械工程系
出处 《机械工程师》 2008年第7期28-30,共3页 Mechanical Engineer
关键词 钝化压头 残余压应力 Oliver&Pharr压入硬度 量纲分析 有限元 blunt indenter residual compressive stress Oliver&Pharr hardness dimensional analysis FEM
分类号 TB381 [一般工业技术—材料科学与工程]
  • 相关文献

参考文献6

  • 1王惠,马德军.残余压应力场中薄膜纳米测量硬度的变化与校正[J].机械工程师,2005(11):70-72. 被引量：3
  • 2[2]Pelletier H,Krier J,Cornet A,et al.Limits of using bilinear stress-strain curve for finite element modeling of nanoindentation response on hulk materials[J].Thin Solid Films,2000,379(1):147-155.
  • 3[3]Dao M,Chollaeoop N,Van Vliet K J,et al.Computational modeling of the forward and reverse problems in instrumented sharp indentation[J].Acta Mater,2001,49(19):3899-3918.
  • 4[4]Hibbitt,Karlsson,Sorensen Inc.ABAQUS theory manual,version 6.2[M].Pawtucet,2000.
  • 5马德军,刘建敏,Chung Wo Ong,何家文.材料杨氏模量的纳米压入识别[J].中国科学（E辑）,2004,34(5):493-509. 被引量：6
  • 6[6]Lee Y H,Kwnn D.Residual stresses in DLC/Si and At/Si systems:application of a stress-relaxation model to the nanoindentation technique[J].J.Mater.Res.,2002,17(4):901-906.

二级参考文献23

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共引文献7

机械工程师
2008年 第7期

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