纳米蒙脱土/光敏稀释剂的合成及其改性环氧丙烯酸酯光固化涂料的研究

Synthesis of a new type of nano - montmorillonite/ photosensitive active diluents and study on it modified EA UV curing coatings

以十八烷基胺蒙脱土、新戊二醇二缩水甘油醚(NGE)、1,6-己二酸与丙烯酸为原料,以N,N-二甲基苯胺为催化剂,以对苯二酚为阻聚剂,合成了纳米蒙脱土改性光敏稀释剂.研究了反应温度、蒙脱土、催化剂用量等因素对反应的影响.实验结果表明,反应温度90-100℃,缩水甘油醚与1,6一己二酸的摩尔比为2:1,N,N-二甲基苯胺的质量分数为1.0%,对苯二酚的质量分数为0.10%时,合成条件最优,合成的改性光敏稀释剂具有良好的贮存稳定性和小的固化体积收缩率.将所合成的光敏稀释剂配合光引发剂、光敏树脂(EA)和适量涂料助剂制成光固化涂料,对其紫外光固化涂料进行了拉伸和冲击实验,得到漆膜的拉伸强度为27.66MPa,对应的断裂伸长率为12.18%,其冲击强度随蒙脱土质量分数的增加而降低.

A novel photosensitive active diluents for the UV curing coatings was synthesized using nano-montmorillonite expanded with octadecylammonium, neopentylglycol diglycidyl ether (NGE), adipic acid and acrylic acid as main raw materials, N, N-dimethylbenzylamine as catalyst and hydroquinone as inhibitor. The preferable synthesizing conditions are reaction temperature = 90-100℃, the ratio of n(NGE): n( adipic acid) =2:1, w (catalyst) = 1.0%, w (inhibitor) = 0.10 %. Photosensitive active diluents has good storage...