摘要
Based on the voltage and current fluctuating phenomenon in the arc plasma load under the negative-pulse-bias, usingthe plasma physics theory and analysis of computer simulation expatiates that the nature of plasma load in vacuumarc plasma is a capacitance load caused by plasma sheath and can be simplified as a parallel unit composed of acapacitor and a resistor, which have exact and quantitative description in the plasma physics theory. It concludes thevalues of capacitance and resistance are thousand PF and hundred ohm from the result of simulation and experiment.As a result, this has solved the key theoretical issues for the design of negative-pulse-bias source specifically used forvacuum arc ion plating.
