偏压对铀上磁控溅射铝镀层微结构及残余应力的影响

Influence of Bias Voltages on Microstructures and Residual Stress of Aluminum Coatings on Uranium Substrate

分别用扫描电镜、X射线衍射仪和应力分析仪研究了5种不同偏压的施加对铀上磁控溅射铝镀层微结构和残余应力的影响。结果表明,偏压强烈影响镀层的组织。-300 V下的组织致密性最差,低偏压下的优于未加偏压(0 V)的;偏压在-200 V及以下时的铝镀层择优取向于(111)低能晶面,高于-200 V时,择优取向由(111)转变为(200)晶面。不同偏压条件下制备的铝镀层的残余应力均较小,为数+MPa量级,但随着偏压的逐渐增加,残余应力由拉应力向压应力转变。

Influence of different bias voltages on microstructures and residual stress of aluminum coatings is investigated by scanning electron microscope (SEM) , X-ray diffraction (XRD) and X-ray stress analyzer, respectively. The result shows that the microstructures are influenced strongly by bias voltages, of which are worst at - 300 V and at low bias voltages are better than at 0 V. The preferential orientation of crystal planes shift from (111) to (200) above -200 V. The residual stress of all coatings is small, which has a change from tensile to compressive stress with the increase of bias voltages.