紫外厚胶光刻技术在3-D MEMS电感中的应用

UV Lithography of SU-8 Photoresist and Its Application in 3-D MEMS Inductors

研究了紫外厚胶光刻技术在三维微机械电感中的应用。实验用负性光刻胶SU-8构造了三维微机械电感的胶结构模型,并对光刻胶的工艺条件进行了研究。结果表明,负性光刻胶SU-8的光敏性好,形成的胶结构侧墙较陡直,能够实现较大的深宽比,为结构复杂的三维微机械电感的制作提供了保证。

The UV lithography technology of SU-8 photoresist and its application in 3-D MEMS inductors are re- ported. The UV lithography process of SU-8 photoresist was studied and optimized. Based on this result, we used SU-8 to fabricate the mold of 3-D MEMS inductors for electroplating. The microstructures with high-as- pect-ratio and vertical sidewalls were patterned, which contribute to the fabrication of 3-D MEMS inductors.