氕氘在锆膜中的分布

The Distribution of Protium and Deuterium in Zirconium Films

电阻蒸发制备的锆膜氢化后,利用二次离子质谱(SIMS)对其进行了深度剖析与成像分析,结果表明氕与氘在锆膜深度分布均匀,在过渡层中呈递减分布,并消失于过渡层与衬底的交界处。锆膜在n(H):n(D)=0.82的气氛中氢化时,会因同位素效应而使氕氘化锆膜中氕的含量高于氘的含量。锆膜表面若有铝、铁、钾以及钠等元素的污染时,会造成表面氕与氘分布不均匀,氕与氘的不均匀分布分别与铝及锆的不均匀分布有关。

The distribution of protium and deuterium in zirconium hydride films are analyzed by using depth profiles and images of SIMS. The results show that protium and deuterium are uniform in the hydride films, but they are degressive in the transition layers and disappear at the boundary between the layers and substrates. The concentration of protium is higher than that of deuterium in zirconium hydride films because of the isotope effects when they are hydrogenated in the atmosphere of n(H):n(D)= 1.20:1. Contaminations of Alt Fe, K and Na on the surface could result in a different distribution of H and D at the surface of zirconium films. Non-uniform distributions of D and H is directly correlated with Al and Zr, respectively.