摘要
Radial distribution of OH diffusion in silica glass preform during jacketing process using a oxy-hydrogen burner was investigated by FTIR spectroscopy. The OH peaks at the jacketing boundary and the surface of the preform were found to be due to diffusion of OH incorporated from the burner.
Radial distribution of OH diffusion in silica glass preform during jacketing process using a oxy-hydrogen burner was investigated by FTIR spectroscopy. The OH peaks at the jacketing boundary and the surface of the preform were found to be due to diffusion of OH incorporated from the burner.
出处
《光学学报》
EI
CAS
CSCD
北大核心
2003年第S1期76-77,共2页
Acta Optica Sinica
