摘要
利用紧束缚分子动力学模拟了硅团簇(n =2 0 )在不同条件下的稳定结构,分析并比较了它们的构型和结合能的大小,结果发现模拟退火温度在 1 70
The stable structure of Silicon Clusters( n=20 ) in different conditions is stimulated with the help of tight binding molecular Dynamics. Their structures and combination capabilities are analyzed and compared. It is found that the most stable structure appears when the simulative annealing temperature is 1700K.
出处
《淮阴师范学院学报(自然科学版)》
CAS
2002年第3期27-29,共3页
Journal of Huaiyin Teachers College;Natural Science Edition
关键词
硅团簇
紧束缚分子动力学
模拟退火
Si 20 clusters
tight binding molecule dynamics
simulation annealing