期刊文献+

旋转电极电火花抛光金刚石膜 被引量:4

POLISHING OF CVD DIAMOND FILMS BY EDM WITH ROTARY ELECTRODE
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摘要 电火花抛光金刚石膜的工艺是预先在金刚石膜表面镀覆一层导电层,然后采用电火花进行加工,使金刚石膜表面突起的尖峰被迅速去除。在单脉冲放电抛光试验中深入地研究了镀层材料对电火花抛光金刚石膜的影响,并证实了加工中金刚石表面的石墨化是使电火花加工得以不断延续的关键。通过旋转电极的抛光试验,验证了旋转电极连续抛光金刚石膜的有效性,提出电火花抛光的机理模型。 The polishing of a diamond film by EDM is such that the surface of the diamond film is coated with a layer of electrically conductive material in advance, and then EDM method is employed to process it. As a result, the peaks on the surface of the diamond film are removed rapidly. In the discharge experi- ment of single pulse, the effect of the coated material on the removal of CVD diamond film has been investigated in detail. It is evident that the graphitization of the surface of CVD diamond film ensures EDM to be continued. The polishing experiment by EDM with rotary electrode indicates the effect of continuous polishing under the action of rotary electrode, by which a physical model of polishing by EDM is put forward.
出处 《机械工程学报》 EI CAS CSCD 北大核心 2002年第z1期168-171,共4页 Journal of Mechanical Engineering
基金 国家自然科学基金(59875014) 广东省自然科学基金(980423)
关键词 金刚石膜 电火花 抛光 CVD diamond films EDM polishing
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参考文献5

  • 1张峥,霍晓.CVD金刚石薄膜抛光技术的研究进展[J].真空科学与技术,2000,20(4):270-273. 被引量:11
  • 2[3]Malshe A P,Park B S,Brown W D, et al. A review of techniques for polishing and planarizing chemically vapor-deposited (CVD) diamond films and substrates. Diamond and Related Materials. 1999(8):1 198~1 213
  • 3[4]Guo Z N,Wang C Y. Investigation into polishing process of CVD diamond films. Materials and Manufacturing Processes. 2002,17(1):45~55
  • 4郭钟宁,王成勇,匡同春,王晓初,黄志刚.电蚀抛光CVD金刚石膜的实验研究[J].金刚石与磨料磨具工程,2000,20(6):6-9. 被引量:5
  • 5[6]Field J E. The Properties of Diamond. (London) ACADEMIC PRESS LIMITED,1979

二级参考文献12

  • 1黄树涛,姚英学,张宏志,袁哲俊.金刚石膜的加工技术[J].新技术新工艺,1996(1):13-14. 被引量:17
  • 2付一良,吕反修,王建军,钟国仿,王亮,杨让.稀土金属抛光金刚石膜技术[J].高技术通讯,1996,6(1):1-5. 被引量:20
  • 3[6]S.Jin et al. ,Shaping of diamond films by etching with molten rare-earth metals. Natrure. 1993,362: 822 - 824.
  • 4[7]M. Yoshikawa et al.. Hot-iron-metal polishing machine for CVD diamond films and characteristrics of the polished surfaces. Surface and coating Technology. 1996,88:197-203.
  • 5[8]A. Hirata, et al., Smoothing of chemically vapour deposited diamond films by ion beam irradiation.Thin Solid Films. 1992, (212):43-48.
  • 6[9]B.G. Bovard et al.. Oxygon-ion beam polishing of a 5-cm diameter film. Applied Optics. 1992,31(13):2306-2369.
  • 7[10]V.P. Ageev, et al., Laser processing of diamond and diamond-link films, Materials & Manufacturing Processes. 1993,8(1):1-7.
  • 8[12]M Hashish. Diamond film polishing whth abrasive-liquid jet:an exploratory investigation. 7th American Waterjet. Conference, August 28-31,1993,793-800
  • 9顾长志,金曾孙,王玉光,庄容书,吕宪义,赵树堂,邹广田.激光修饰金刚石膜的表面抛光技术[J].科学通报,1997,42(6):661-664. 被引量:12
  • 10顾长志,金曾孙.金刚石膜的性质、应用及国内外研究现状[J].功能材料,1997,28(3):232-236. 被引量:32

共引文献14

同被引文献61

  • 1周丽,黄树涛,许立福,焦可如.金刚石膜超高速抛光温度场的有限元模拟[J].人工晶体学报,2009,38(1):152-158. 被引量:5
  • 2黄树涛,姚英学,张宏志,袁哲俊.金刚石膜的加工技术[J].新技术新工艺,1996(1):13-14. 被引量:17
  • 3严朝辉,汪建华,满卫东,熊军.CVD金刚石厚膜的机械抛光研究[J].金刚石与磨料磨具工程,2007,27(3):32-35. 被引量:16
  • 4Malshe A P, Park B S, Brown W D, et al. A Review of Techniques for Polishing and Planarizing Chemically Vapor-deposited (CVD) Diamond Films and Substrates [ J ]. Diamond and Related Materials, 1999,8 ( 7 ) : 1198-1213.
  • 5Tang C J, Neves A J, Femandes A J S, et al. A New Elegant Technique for Polishing CVD Diamond Films[J]. Diamond and Related Materials, 2003, 12(8): 1411-1416.
  • 6Wang C Y, Zhang F L, Kuang T C, et al. Chemical/Mechanical Polishing of Diamond Films Assisted by Molten Mixture of LiNO3 and KNO3 [J]. Thin Solid Films, 2006, 496(2) :698-702.
  • 7Yoshikawa M, Okuzumi F. Hot-iron-metal Polishing Machine for CVD Diamond Films and Characteristics of the Polished Surfaces [ J ]. SuoCace and Coating Technology, 1996,88 ( 1-3 ) :197-203.
  • 8Zaitsev A M, Kosaea G, Rieharz B, et al. Thermoehemical Polishing of CVD Diamond Films[ J]. Diamond and Related Materials, 1998,7 (8) : 1108-1117.
  • 9Hirata A, Tokura H, Yoshikawa M. Smoothing of Chemically Vapour Deposited Films by Ion Beam Irradiation[ J]. Thin Solid Films, 1992, 212 ( 1-2 ) :43-48.
  • 10Ozkan A M, Malshe A P, Brown W D. Sequential Multiple-laser-assisted Polishing of Free-standing CVD Diamond Substrates[J].Diamond and Related Materials, 1997, 6( 12 ) : 1789-1798.

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