一种通过光刻工艺实现细线宽的厚膜布线技术

Fine-Line Routing on Thick-Films Using Optical Lithography

采用传统厚膜布线工艺通常可实现150μm的线宽,而达到50μm以下的线宽是非常困难的。文章介绍了一种利用光刻技术结合厚膜工艺实现10～50μm线宽的技术,并给出了该项技术在实际产品中的应用实例。

Using the conventional thick film technology, the achievable lineresolution is 150 μm A thickfilm based routing technology using optical lithography is presented in the paper, with which 10～50 μm fine lines can be achieved An example is given to illustrate the application of this technology in the fabrication of hybrid IC's