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p型Al/6H-SiC肖特基二极管特性的研究 被引量:1

A Study of the Characteristics of p-Type Al/6H-SiC Schottky Diode
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摘要 作者研究了p型Al/6H -SiC肖特基二极管的基本制作工艺及其电学参数 .采用电流 -电压法 (I~V) ,测试了肖特基二极管的理想因子n和肖特基势垒高度b.对其基本电学参数n和b 的温度特性进行了研究 .分析了串联电阻对I~V特性的影响 . The manufacturing processes and electrical parameters of p-type 6H-SiC Schottky diodes have been studied.The ideality factors n and barrier heights  b of the Schottky diodes were measured with method of current-voltage( I~V ).Temperature characteristics of the ideality factor n and barrier height  b were present.Analyses of the effects of the series resistance on I~V characteristics of the Schottky diodes were carried out.
出处 《四川大学学报(自然科学版)》 CAS CSCD 北大核心 2001年第S1期53-56,共4页 Journal of Sichuan University(Natural Science Edition)
关键词 6H碳化硅 肖特基二极管 宽禁带半导体 H-SiC Schottky diode wide band semiconductor
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参考文献6

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同被引文献14

  • 1廖伟,罗小蓉,廖勇明,洪根深,龚敏.SiO_2/6H-SiC界面的物理性质及其辐照特性的研究[J].四川大学学报(自然科学版),2001,38(S1):48-52. 被引量:2
  • 2钟志亲,刘洪军,袁菁,王欧,刘畅,龚敏.红外反射法研究6H-SiC表面热氧化生长的SiO_2特性[J].光散射学报,2004,16(3):256-259. 被引量:2
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