磁过滤对多弧离子镀(TiAl)N薄膜的影响

Deposition and properties of high quality (TiAl)N hard coatings

介绍了利用过滤电弧离子镀沉积 (TiAl)N薄膜初步的研究结果。在电弧靶材前沿的磁场作用下 ,有效减小了薄膜的宏观颗粒尺寸 ,并极大地降低了颗粒密度。同时 ,过滤电弧的作用 ,使偏压对膜成分的影响减弱 ,薄膜的硬度随膜中铝含量的增加而提高 ,(TiAl)N的抗氧化能力明显提高。

Deposition and properties of (TiAl)N have been investigated by filter arc evaporation. The size and density of macroparticle in (TiAl)N films are considerably decreased under the basement of electron's and ion's movement in the straight filter. The bias voltage appears to be the main parameter controlling the final composition in the conventional arc evaporation process. But under the filter arc evaporation process, the influence of the bias voltage on the final composition of the (TiAl)N are abated. Increasing aluminum content leads to an increase in surface hardness. The oxidation resistance of the (TiAl)N is obviously superior to that of TiN film.