Effect of Annealing Temperature on the Formation of Silicides and the Surface Morphologies of PtSi Films 被引量：2

Effect of Annealing Temperature on the Formation of Silicides and the Surface Morphologies of PtSi Films

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摘要 The effect of annealing temperature on the formation of the PtSi phase. distribution of silicides and the surface morphologies of silicides films is investigated by XPS. AFM. It is shown that the phase sequences of the films change from Pt-Pt2Si-PtSi-Si to Pt+Pt2Si+PtSi-PtSi-Si or Pt+Pt2Si+PtSi-PtSi-st with an increase of annealing temperature and the reason for the formation of mixed layers is discussed. The effect of annealing temperature on the formation of the PtSi phase. distribution of silicides and the surface morphologies of silicides films is investigated by XPS. AFM. It is shown that the phase sequences of the films change from Pt-Pt2Si-PtSi-Si to Pt+Pt2Si+PtSi-PtSi-Si or Pt+Pt2Si+PtSi-PtSi-st with an increase of annealing temperature and the reason for the formation of mixed layers is discussed.

作者 Jinghua YIN Meicheng LI Yufeng ZHENG Zhong WANG Wei CAI Peilin WANG School of Materials Science and Engineering, Harbin institute of Technology, Harbin 150001, China

出处《Journal of Materials Science & Technology》 SCIE EI CAS CSCD 2001年第1期39-40,共2页 材料科学技术（英文版）

关键词 Effect of Annealing Temperature on the Formation of Silicides and the Surface Morphologies of PtSi Films

分类号 O484 [理学—固体物理]

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同被引文献4

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2001年第1期

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Effect of Annealing Temperature on the Formation of Silicides and the Surface Morphologies of PtSi Films 被引量：2

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