摘要
本文叙述了ＺｒＯ２陶瓷用等静压工艺的制造方法，确定了ＺｒＯ２陶瓷和金属封接的工艺参数，并且阐明了界面反应层的ＸＰＳ图谱。
This paper has studied zirconia ceramic processing by isostataic process, The technology parameters are determined in the field of ZrO2 ceramic to metal seal and finally, It shows XPS picture of reaction layer in the interface.
出处
《陶瓷学报》
CAS
2001年第4期259-262,共4页
Journal of Ceramics
