摘要
本文利用非平衡磁控溅射设备,采用四种不同的TiN到Ti-O的过渡方式,在Si(100)和Ti6Al4V基体上制备了TiN/Ti-O薄膜。采用X射线衍射(XRD)分析薄膜的结构;使用AMBIOSXP-2台阶仪检测薄膜应力;利用HXD1000Bknoop型显微硬度仪、瑞士CSEM销盘摩擦磨损实验机、WS—97系统划痕实验机对薄膜的力学性能进行检测。结果表明,在钛合金表面制备TiN薄膜后,逐渐降低N2流量至0sccm,沉积一层Ti膜,再用逐渐通入O2制备Ti-O薄膜的工艺制备的TiN/Ti-N/Ti/Ti-O薄膜具有较好的力学性能。
The TiN/Ti-O composite films were deposited by unbalanced magnetron sputtering on silicon(100)and titanium alloy(Ti6Al4V)substrates.The microstructures and mechanical properties of the films were characterized with X-ray diffraction(XRD),scanning electron microscopy(SEM)and conventional mechanical probes.The results show that the film growth conditions strongly affect the mechanical properties of the Ti-O layers on top of the TiN-covered Ti substrates.For example,the TiN/Ti-O composite films display excelle...
出处
《真空科学与技术学报》
EI
CAS
CSCD
北大核心
2008年第S1期47-51,共5页
Chinese Journal of Vacuum Science and Technology
基金
国家自然科学基金重点项目(No.50535050)
四川省科技攻关项目(No.2006J02-006-4)
表面物理与化学国家重点实验室基金资助(No.90000460200605)
