摘要
在使用简化的等离子体放电模型的基础上,模拟了圆柱谐振腔式微波等离子体沉积室中,不同金刚石膜生长条件下微波等离子体的分布状态。在模拟中,针对纳米金刚石的生长环境,就纯氩气反应气体中,不同的输入功率、不同气体压力条件下,沉积室中形成的等离子体分布的变化规律进行了模拟,将其与一般氢气气氛下的相应模拟结果相对比。模拟所获得的结果,对微波等离子体方法沉积金刚石膜的操作环境的优化,有着一定的指导意义。
By using a tractable plasma description, distribution of microwave plasma under various operating conditions for deposition of diamond films in a cylindrical microwave plasma reactor has been simulated. In simulation, for the growth environment of nano-diamond, dependence of plasma distribution in the rector on the microwave input power and gas pressure of pure argon atmosphere has been studied. The simulation results were compared with the corresponding results of hydrogen atmosphere. The results obtained ...
出处
《真空与低温》
2008年第3期157-163,共7页
Vacuum and Cryogenics
基金
国家自然科学基金(No
10675017)资助。
关键词
金刚石膜
微波等离子体
FDTD方法
数值模拟
diamond film
microwave plasma
finite-difference time-domain method
numerical simulation
