DIAMOND HETEROEPITAXY-NUCLEATION, INTERFACE STRUCTURE, FILM GROWTH
DIAMOND HETEROEPITAXY-NUCLEATION, INTERFACE STRUCTURE, FILM GROWTH
摘要
The present understanding of diamond heteroepitaxy by bias-enhanced chemical vapour deposition on technologically relevant substrate materials is briefly reviewed. First the early stages of diamond nucleation and the diamond film growth as well as influences of various deposition conditions are described. Then the results of microscopic investigations of the structure of interfaces and of grain boundaries are summarized.
The present understanding of diamond heteroepitaxy by bias-enhanced chemical vapour deposition on technologically relevant substrate materials is briefly reviewed. First the early stages of diamond nucleation and the diamond film growth as well as influences of various deposition conditions are described. Then the results of microscopic investigations of the structure of interfaces and of grain boundaries are summarized.
参考文献45
-
1[1]A. Lettingdon and J. W. Steeds, Thin Film Diamond (Chapman & Hall, London, 1994).
-
2[2]H. Kawarada, in Low-Pressure Synthetic Diamond eds. B. Dischler and C. Wild (Springer Berlin. 1998) p.140.
-
3[3]M. Werner and R. Locher, Rep. Prog. Phys. 61 (1998) 1665.
-
4[4]H. Verhoeven, A. F1oter, H. Reiβ, R. Zachai, D. Wittorf and W. Jager, Appl. Phys. Lett. 71 1997) 1329.
-
5[5]H. Kawarada, M. Aoki and M. Ito, Appl. Phys. Lett. 65 (1994) 1563.
-
6[6]H. Gittler, A. Floter, E. Kohn, P. Gluche, X. Jiang, C.P. Klages, G. Dollinger, A. Bergmaier. D.Wittorf and W. Jager, Evaluation of Semiconducting CVD Diamond Films for Electronic and Sensor Applications (Entwicklung Halbleitender Diamantschichten, Werkstoffwoche '98, Symposium 1, Werkstoffe fir die Informationstechnik, Herausgeber K. Kempter und J. Hauβelt, Wiley-VCH, Weinheim,1999) p.189.
-
7[7]A. Denisenko, A. Aleksov and E. Kohn, Diamond Rel. Mater. 10 (2001) 667.
-
8[8]M. Adamschik, M. Hinz, C. Maier, P. Schmid, H. Seliger, E.P. Hofer and E. Kohn Diamond Re1.Mater. 10 (2001) 722.
-
9[9]X. Jiang and C.-P. Klages, Appl. Phys. Lett. 62 (1993) 3438.
-
10[10]B.R. Stoner, S.R. Sahaida, J.P. Bade, P. Southworth, P.J. Ellis, J. Mater. Res. 8 (1993) 1334.
-
1Zhangda LIN and Kean FENG(The State Key Laboratory of SurfacePhysics, CAS Institute of Physics).MECHANISM OF THE GROWTH, NUCLEATION, AND HETEROEPITAXY OF METASTABLE DIAMOND FILMS ON ATOMIC SCALE[J].Bulletin of the Chinese Academy of Sciences,1998,12(4):268-269.
-
2Zhenzhong QI,Guopin DU,Hanqi KE and Weiguo YAO(Institute of Solid State Physics, Chinese Academy of Sciences, Hefei, 230031, China).Investigation on the Initial Stage of Film Growth in Situ[J].Journal of Materials Science & Technology,1994,10(6):451-454.
-
3易新建,郝建华,张新宇,G.K.Wong.α-Sn thin film grown on GaAs substrate by MBE and investigation of its multiquantum well structure[J].Science China Mathematics,1998,41(4):399-404.
-
4王霞,彭晓华.集对分析中联系数的运算及其应用[J].辽宁工程技术大学学报(自然科学版),2004,23(2):275-276. 被引量:12
-
5张晶晶.条件概率的第三种解法[J].考试周刊,2013(84):62-62.
-
6权伟龙,李红轩,赵飞,吉利,杜雯,周惠娣,陈建敏.Molecular Dynamical Simulations on a-C:H Film Growth from C and H Atomic Flux: Effect of Incident Energy[J].Chinese Physics Letters,2010,27(8):228-231.
-
7WU Feng-Min LU Hang-Jun FANG Yun-Zhang HUANG Shi-Hua.Coverage Dependence of Growth Mode in Heteroepitaxy of Ni on Cu(100) Surface[J].Communications in Theoretical Physics,2008,50(7):231-236.
-
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-
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-
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