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STOCHASTIC CRACKING AND HEALING BEHAVIORS OF THIN FILMS DURING REACTION-DIFFUSION GROWTH 被引量:6

STOCHASTIC CRACKING AND HEALING BEHAVIORS OF THIN FILMS DURING REACTION-DIFFUSION GROWTH
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摘要 The stochastic cracking and healing behaviors of reaction-diffusion growth of thin filmswere studied by means of Markov processes analysis. We chose the thermal growth ofoxide scales on metals as an example of reaction-diffusion growth. The thermal growthof oxide films follows power law when no cracking occurs. Our results showed that thegrowth kinetics under stochastic cracking and healing conditions was different fromthat without cracking. It might be altered to either pseudo-linear or pseudo-power lawsdependent upon the intensity and frequency of the cracking of the films. When thehoping items dominated, the growth followed pseudo-linear law; when the diffusionalitems dominated, it followed pseudo-power law with the exponentials lower than theintrinsical values. The numerical results were in good agreement with the meassuredkinetics of isothermal and cyclic oxidation of NiAl-0.1 Y (at. %) alloys in air at 1273K. The stochastic cracking and healing behaviors of reaction-diffusion growth of thin filmswere studied by means of Markov processes analysis. We chose the thermal growth ofoxide scales on metals as an example of reaction-diffusion growth. The thermal growthof oxide films follows power law when no cracking occurs. Our results showed that thegrowth kinetics under stochastic cracking and healing conditions was different fromthat without cracking. It might be altered to either pseudo-linear or pseudo-power lawsdependent upon the intensity and frequency of the cracking of the films. When thehoping items dominated, the growth followed pseudo-linear law; when the diffusionalitems dominated, it followed pseudo-power law with the exponentials lower than theintrinsical values. The numerical results were in good agreement with the meassuredkinetics of isothermal and cyclic oxidation of NiAl-0.1 Y (at. %) alloys in air at 1273K.
出处 《Acta Metallurgica Sinica(English Letters)》 SCIE EI CAS CSCD 2001年第6期544-548,共5页 金属学报(英文版)
基金 supported by Hundred-Talent Project of Chinese Academy of Sciences by the National Natural Science Foundation of China for Young Scientist
关键词 stochastic analysis reaction-diffusion growth oxide films stochastic analysis reaction-diffusion growth oxide films
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  • 1[1]K. Hauffe, Oxidation of Metals (Plenum Press, New York, 1965) p.87.
  • 2[2]P. Kofstad, High Temperature Corrosion (Elsevier Applied Science, London and New York, 1988).
  • 3[3]H.E. Evans and J.R. Nicholls, EFC Workshop: Life Time Modeling of High Temperature Corrosion Processes (Frankfurt, Feb. 2001).
  • 4[4]J.R. Nicholls and M.J. Bennett, EFC Workshop: Life time Modeling of High Temperature Corrosion Processes (Frankfurt, Feb. 2001).
  • 5[5]C.E. Lowell, C.A. Barrett, R.W. Palmer, J.V. Auping and H.B. Probst, Oxidation of Metals 36 (1991) 81.
  • 6[6]M. Schutze, Werkst. Korros. 38 (1987) 597.
  • 7[7]O. Kubaschewski and B.E. Hopkins, Oxidation of Metals and Alloys (Butterworths, London. 1962) p.168.

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