摘要
Ti thin films were firstly deposited on glass substrates by magnetron sputtering method, then sintered the Ti thin films in air atmosphere and finally TiO2 transparence thin films on glass substrates were obtained. The structure and surface morphologies of the thin films were characterized by X-ray diffraction and SEM. The growth process of the thin films has been observed. The annealing time and annealing temperatures have an affect on the growth of the films.
Ti thin films were firstly deposited on glass substrates by magnetron sputtering method, then sintered the Ti thin films in air atmosphere and finally TiO2 transparence thin films on glass substrates were obtained. The structure and surface morphologies of the thin films were characterized by X-ray diffraction and SEM. The growth process of the thin films has been observed. The annealing time and annealing temperatures have an affect on the growth of the films.
作者
L.S.Yin1,3), H. Shen2) and J.X. Zhang3) 1)College of Information Engineering, Central South University, Changsha 410075, China 2)Guangzhou Institute of Energy Conversion, CAS, Guangzhou 510070, China 3)Department of Physics, Zhongshan University, Guang
基金
The authors would like to thank the Hundred Talents Project of The Chinese Academy of Sciences
Science and Technology Committ
