基于光刻胶热熔法的全息光栅表面粗糙度平滑处理

Smoothing for Surface Roughness of Holographic Grating Based on Photoresist Melting Method

根据表面热动力学原理提出了一种成本低廉、制作周期短、易于实现的光刻胶热熔法,阐述了光刻胶热熔法的基本原理,探讨了光刻胶热熔对光刻胶光栅表面刻槽形状的影响。实验中,分别对经过和未经过热熔处理的光刻胶光栅做了离子束刻蚀。结果表明,利用表面张力作用可使熔融状态下的光刻胶光栅刻槽表面变得平滑,粗糙度降低,并且成功地在K9玻璃基底上得到了槽形较好的全息光栅。

The photoresist melting method which is low-cost, short-period and easy realization was put forward based on surface thermodynamics and its basic principle was expatiated, and the influence of the photoresist melting on the groove profiles of the photoresist grating was investigated. The melted photoresist grating and the un-melted one were etched by Ar ion beam, respectively. The experimental results show that the groove surface roughness of the grating can be reduced by the surface tension of the melted photoresist. In addition, the holographic grating with preferable groove profiles is successfully obtained on K9 glass substrate by the method.