摘要
根据表面热动力学原理提出了一种成本低廉、制作周期短、易于实现的光刻胶热熔法,阐述了光刻胶热熔法的基本原理,探讨了光刻胶热熔对光刻胶光栅表面刻槽形状的影响。实验中,分别对经过和未经过热熔处理的光刻胶光栅做了离子束刻蚀。结果表明,利用表面张力作用可使熔融状态下的光刻胶光栅刻槽表面变得平滑,粗糙度降低,并且成功地在K9玻璃基底上得到了槽形较好的全息光栅。
The photoresist melting method which is low-cost, short-period and easy realization was put forward based on surface thermodynamics and its basic principle was expatiated, and the influence of the photoresist melting on the groove profiles of the photoresist grating was investigated. The melted photoresist grating and the un-melted one were etched by Ar ion beam, respectively. The experimental results show that the groove surface roughness of the grating can be reduced by the surface tension of the melted photoresist. In addition, the holographic grating with preferable groove profiles is successfully obtained on K9 glass substrate by the method.
出处
《微细加工技术》
EI
2007年第1期11-14,共4页
Microfabrication Technology
基金
"十一五"国家科技支撑计划重大项目资助(2006BAK03A02)
中国科学院知识创新工程青年基金资助项目(Q05J03Z)
关键词
全息光栅
光刻胶热熔法
离子束刻蚀
原子力显微镜
holographic grating
photoresist melting method
Ar ion beam etch
atomic force microscope(AFM)