两种离子束方法制备Cr膜的分析研究

Analyses of the Cr Films Prepared by Two Different Methods

在室温下,采用离子束溅射同时经100 keV Ar+离子轰击的动态离子束混合技术和采用离子束溅射技术这两种方法制备Cr膜,并用XPS,SEM及AES对薄膜的结构、表面形貌、薄膜与基体附着力的影响等进行分析对比。结果表明,与离子束溅射技术制备的Cr膜相比较,动态离子束混合技术制备的Cr膜表面平滑,膜致密呈无气隙的柱状结构,且薄膜元素与基体元素混合形成的组分过渡层较宽,因而有效地提高了Cr膜的附着力。

Cr films were prepared by two ion beam methods. One is that the Cr films is deposited on substrate by Ar+ ion beam sputtering at room temperature and simultaneously bombarded with 100 keV Ar+ ion beam, i.e. the Cr films were prepared by dynamic ion beam mixing. The other is that the Cr films were only deposited by ion beam sputtering at room temperature. Microstructure, surface micrographs and adhesion behaviors to substrates for these films were characterized with XPS, SEM and AES. The results show that the surfaces of the films prepared with dynamic ion beam mixing are more smooth, the films are denser and more compact, and the transition layer between the film and the substrate is thicker, hence the adhesion of the Cr film to substrate is stronger than those prepared by ion beam sputtering.