摘要
为改善微柱透镜阵列的制作技术、消除光刻工艺对光刻掩模版的依赖,研究了利用全息-热熔技术制作微柱透镜阵列的新方法,即首先采用了全息技术进行曝光,然后利用光刻胶热熔技术在K9玻璃基底上制作出了面形良好的微柱透镜阵列。实验结果表明,进行全息曝光并显影后,能够在光刻胶表面产生良好的正弦阵列表面结构,之后采用光刻胶热熔技术可将光刻胶的正弦阵列结构转变为微柱透镜阵列,且实验结果良好。
A new fabricating method of micro-cylindrical lens arrays by adopting holographic exposure-melting photoresist technology is studied to improve the fabrication technology of micro-cylindrical lens arrays and eliminate dependence of photo-masks during photolithography. The photoresist is exposed by holographic technology and then melted to make a fine micro-cylindrical lens array on the K9 glass substrate. The results show that a fine sinusoidal array structure is formed on the photoresist surface by holographic exposure and it is changed into a micro-cylindrical lens array by melting of the photoresist. The result provides a new technology of fabrication of micro-cylindrical lens arrays and it is significant to further improve of the fabrication technology of micro-cylindrical lens arrays.
出处
《微细加工技术》
EI
2006年第4期17-20,共4页
Microfabrication Technology
关键词
微柱透镜阵列
全息曝光
光刻胶热熔
micro-cylindrical lens array
holographic exposure
melting photoresist
